PARIS, July 7, 2016 — Semico nductor IP provider Almae Technologies SAS is taking over the facilities of spin-off company III-V Lab to use its epitaxy reactors and electro nic nanolithography equipment for the production of semico nductor wafers for the telecommunications market.

With over 2000 m2 of clean rooms, Almae said it will have an annual full production capacity of several thousand semico nductor wafers, incorporating new-generation laser compo nents that support high-speed access over optical fiber.

Along with the equipment acquisition, Almae will benefit from a technology transfer from III-V Lab with operation support for the laboratory’s R&D team in laser design, fabrication and characterization.

Almae Technologies designs and produces indium phosphide wafers used to implement photo nics circuits integration semico nductor lasers. III-V develops optoelectro nic and microelectro nic compo nents ba sed on semico nductors and their integration with silicon circuits.